![Lithography Defects Caused by AMC](https://www.pmeasuring.com/wp-content/uploads/2021/05/semi-5.jpg)
Lithography Defects Caused by AMC (Airborne Molecular Contamination) in the Functional Area
There is a need for more control of deleterious environmental contamination, including better detection and real-time response to undesired AMC concentration levels, the most prevalent of which are the amines class of AMCs.